Pulp & Paper
Well-T’s colloidal silica supports wet-end control and surface coating performance, improving retention, drainage, coating quality, and process efficiency across specialty paper, board, and packaging applications.
With high-surface-area systems and modified grades, our solutions are designed to optimize papermaking processes from fiber retention to functional surface enhancement.
Key Advantages
Enhanced Retention & Drainage
Small particles with high surface area improve fine fiber and filler retention, accelerating dewatering and supporting more stable paper production.
Unlocking Surface Property
Colloidal silica integrates with coating formulations to improve surface smoothness, gloss, and printability, enabling more uniform and higher-quality paper finishes.
Paper Friction Enhancement
Silica-based surface treatment improves friction performance and stacking stability, helping reduce slip and improve efficiency in packaging and transportation processes.
Featured Products
| Product | Features | Density (g/cm³) | Particle Size (m²/g) | Surface Area (nm) | SiO₂% | Na₂O% | pH | Viscoity (mm²/s) |
|---|---|---|---|---|---|---|---|---|
| SMALL PARTICLE SERIES (2) | ||||||||
| Sodium-Stabilized High Surface Area | 1.1 | 3-5 | 650 | 15% | ≤1.0 | 10.0-11.5 | ≤5 | |
| Sodium-Stabilized High Surface Area | 1.2 | 10-16 | 250 | 30% | ≤0.5 | 9.0-10.5 | ≤8 | |
| LARGE PARTICLE SERIES (1) | ||||||||
| Sodium-Stabilized High Solids Content | 1.4 | 70-90 | 60 | 45% | ≤0.3 | 9.0-10.5 | ≤6.5 | |
| MODIFIED SERIES (1) | ||||||||
| Cationic-Modified | 1.2 | 40-80 | / | 30% | / | 2.0-5.0 | ≤20 | |
Well-T in Action
Learn More >Well-T Technology R&D Center Renewed and Inaugurated, Continuously Driving Innovative Development
December 20, 2025Well-T Technology Attends the China Inorganic Salts Industry Development Conference and Is Awarded Vice President Unit
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December 1, 2025Well-T Technology Shines at the Wuxi Precision Casting Annual Conference; the "Well-T Cup" Empowers High-Quality Industry Development
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30 years of experience. Tailored solutions for your colloidal silica challenges.
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