CMP Grade Colloidal Silica
Engineered for CMP applications, Well-T’s CMP Grade combines near-PPB metal purity with consistent particle size for stable polishing and superior surface quality.
Key Features
- Near-PPB metal impurity control
- High-purity colloidal silica for CMP
- Consistent particle size for stable polishing
- Strict contamination control throughout production
Featured Products
| Product | Features | Density (g/cm³) | Surface Area (m²/g) | Particle Size (nm) | SiO₂% | Na₂O% | pH | Viscosity (mm²/s) |
|---|---|---|---|---|---|---|---|---|
| CMP SERIES (4) | ||||||||
 SK-6050 HP | Low-Sodium, High-pH | 1.4 | 60-90 | 70 | 50% | ≤150ppm | 9.0-10.5 | ≤25 |
| SD-10050 HP | Near-PPB Purity | 1.4 | 90-110 | 50 | 50% | ≤10ppm | 9.0-10.5 | ≤25 |
| SK-6050 UHP | Low-Sodium, High-pH | 1.4 | 60-90 | 70 | 50% | ≤150ppm | 9.0-10.5 | ≤25 |
| SD-10050 UHP | Near-PPB Purity | 1.4 | 90-110 | 50 | 50% | ≤10ppm | 9.0-10.5 | ≤25 |
Featured Markets
Learn More >
Well-T in Action
Learn More >
January 23, 2026
Well-T Technology R&D Center Renewed and Inaugurated, Continuously Driving Innovative Development
December 20, 2025
Well-T Technology Attends the China Inorganic Salts Industry Development Conference and Is Awarded Vice President Unit
December 12, 2025
Well-T and Kingdee Cloud Project Officially Sets Sail, Comprehensively Entering a New Stage of Digital Management
December 1, 2025
Well-T Technology Shines at the Wuxi Precision Casting Annual Conference; the "Well-T Cup" Empowers High-Quality Industry Development
Connect with Well-T
30 years of experience. Tailored solutions for your colloidal silica challenges.
Contact Us >